Duke's Hisham Massoud Elected Fellow of the Electrochemical Society

May 24, 2006

DURHAM, N.C. – Duke University electrical and computer engineering Professor Hisham Massoud has been elected a fellow of the Electrochemical Society (ECS) in recognition for his contributions to the understanding of silicon oxidation kinetics, ultrathin gate dielectrics, and the Si-SiO2 interface.

Massoud’s pioneering contributions in the field of silicon oxidation in the ultrathin-oxide regime are universally implemented in process modeling software tools used world wide to design ultrathin gate-insulator processes in IC technology. In addition, he developed an analytical relationship that describes the oxide growth, thus facilitating the calculation of oxide growth characteristics and serving as a starting point for understanding the physical mechanisms underlying oxide growth in the initial growth regime.

Massoud has been focused on the technology, characterization, and electrical properties of ultrathin dielectric layers. He has also been elected fellow of the Institute of Electrical and Electronics Engineers in 1997 and awarded the 2006 Electronics and Photonics Division Award of the Electrochemical Society (ECS) for his work on ultrathin silicon dielectric films.

Massoud was elected chairman of the Executive Committee of the Electronics Division of the Electrochemical Society in 1997. He has chaired numerous ECS conferences, including the International Symposium on ULSI Science and Technology and the International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface. And, he chaired the Solid State Monograph Committee of the ECS in 1993. He has published 25 papers in ECS publications and has been an editor of four ECS Conference Proceedings.

Massoud is the chair of Duke’s Electrical and Computer Engineering Department at the Pratt School of Engineering. He earned a bachelor of science in electrical engineering from Cairo University in 1973, and a Master of Science and Ph.D. in electrical engineering from Stanford University in 1976 and 1983 respectively. He has been on the faculty at Duke since 1983.

In addition to his role at Duke, Massoud was a research scientist at the IBM Thomas J. Watson Research Center, Yorktown Heights, N.Y., in 1977 and 1980-81, the Microelectronics Center of North Carolina in 1987, the Hewlett-Packard Integrated Circuits Business Division in 1992, and the Max-Planck Institute for Microstructure Physics in 1997 and 1998.